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55 μm can be achieved. Our results provide design insight toward fully exploiting a single-mode, wide-band, and ultra low-loss HC-ARF. In addition, the extraordinary optical properties of the proposed fiber can be beneficial for several applications such as future optical communication system, high energy light transport, extreme non-nonlinear optics and beyond.Defect inspection on lithographic substrates, masks, reticles, and wafers is an important quality assurance process in semiconductor manufacturing. Coherent Fourier scatterometry
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