https://www.selleckchem.com/pr....oducts/nvp-tnks656.h
5 V. We expect that in combination with large-area printing, the bilayer oxide dielectrics are beneficial for large-area solution-based oxide electronics on silicon substrates, while DUV photoactivation can be applied to various types of solution-processed functional metal oxides such as phase-transition memories, ferroelectrics, photocatalysts, charge-transporting interlayers and passivation layers, etc. on silicon substrates.Gas management during electrocatalytic water splitting is vital for improving the efficiency of clean hydro
Gefällt mir
Kommentar
Teilen
