https://www.selleckchem.com/pr....oducts/phosphoramido
Finally, the abatement of DNAPL with simultaneous addition of surfactant and PSA was studied. At the conditions used, a negligible unproductive consumption of PS was found by SDS; meanwhile, PS consumption at 360 h ranged between 70 and 80% using the nonionic surfactants. The highest ratios of ESC/ESCo were found with SDS and E3 and these surfactants were chosen for the S-ISCO treatment. When oxidant and surfactant were simultaneously applied for DNAPL abatement the COC conversion was more than three times higher wi
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