https://www.selleckchem.com/pr....oducts/mps1-in-6-com
The thickness uniformity of the molecular beam epitaxial film is one of the most important factors affecting the quality of the film, and it is mainly influenced by the angular distribution of the molecular source, which is mainly determined by the inner wall shape of the crucible. In this paper, an optimization method based on particle swarm optimization, Monte Carlo simulations, and an artificial neural network is proposed, aiming at optimizing the epitaxial film uniformity in the molecular beam epitaxy process. The opti
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