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In this study, the titanium layers from 12 to 1470 nm thick were fabricated by using the method involving dynamically changed working gas pressure (gas injection magnetron sputtering). The influence of the deposition time on the optical and electrical properties of Ti films, as well as on their microstructure, are considered. The samples are investigated by means of spectroscopic ellipsometry, atomic force microscopy, X-ray diffraction, and confocal optical microscopy. Additionally, for the Ti layers, the sheet resistance was determined
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