Hydrogen Silsesquioxane EBL Resist for High Resolution Electron Beam Lithography
Electron beam lithography is essential for applications that demand feature sizes beyond the limits of optical techniques. As dimensions shrink, resist performance becomes a defining factor in pattern fidelity and process reliability. Engineers and researchers working at the nanoscale rely on materials such as hydrogen silsesquioxane ebl resist to achieve the level of resolution required for advanced device fabrication.
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