https://www.selleckchem.com/pr....oducts/pf-03084014-p
Notwithstanding its excellent properties such as high work function and low resistance, Ru has not been widely applied in the preparation of electrodes for various electronic devices. This is because of the occurrence of severe morphological degradation in the actual devices employing Ru. Herein, we investigated Ru chemistry for electrode application and the degradation mechanism of Ru during subsequent processes such as thin film deposition or thermal annealing. We revealed that subsurface oxygen induces Ru degradation o
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