https://www.selleckchem.com/products/a-674563.html
In this study, by inserting a buffer layer of TiOx between the SiOxAg layer and the bottom electrode, we have developed a memristor device with a simple structure of Ag/SiOxAg/TiOx/p++-Si by a physical vapor deposition process, in which the filament growth and rupture can be efficiently controlled during analog switching. The synaptic characteristics of the memristor device with a wide range of resistance change for weight modulation by implementing positive or negative pulse trains have been investigated extensively. Several learning
Me gusta
Comentario
Compartir
